Filling high aspect-ratio nano-structures by atomic layer...

Filling high aspect-ratio nano-structures by atomic layer deposition and its applications in nano-optic devices and integrations

Wang, Jian Jim, Deng, Xuegong, Varghese, Ron, Nikolov, Anguel, Sciortino, Paul, Liu, Feng, Chen, Lei, Liu, Xiaoming
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Volume:
23
Year:
2005
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.2132326
File:
PDF, 1.32 MB
english, 2005
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