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Low temperature hydrogen plasma-assisted atomic layer deposition of copper studied using in situ infrared reflection absorption spectroscopy
Chaukulkar, Rohan P., Thissen, Nick F. W., Rai, Vikrant R., Agarwal, SumitVolume:
32
Year:
2014
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4831915
File:
PDF, 1.33 MB
english, 2014