Reactive ion etching of quartz and Pyrex for...

Journal of Applied Physics 2002 Vol. 92; Iss. 7

Reactive ion etching of quartz and Pyrex for microelectronic applications

Zeze, D. A., Forrest, R. D., Carey, J. D., Cox, D. C., Robertson, I. D., Weiss, B. L., Silva, S. R. P.
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Volume:
92
Year:
2002
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.1503167
File:
PDF, 485 KB
english, 2002
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