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An ultra clean self-aligned process for high maximum oscillation frequency graphene transistors
Feng, Z.H., Yu, C., Li, J., Liu, Q.B., He, Z.Z., Song, X.B., Wang, J.J., Cai, S.J.Volume:
75
Language:
english
Journal:
Carbon
DOI:
10.1016/j.carbon.2014.03.060
Date:
August, 2014
File:
PDF, 1.40 MB
english, 2014