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Highly ionized physical vapor deposition plasma source...

Highly ionized physical vapor deposition plasma source working at very low pressure

Stranak, V., Herrendorf, A.-P., Drache, S., Cada, M., Hubicka, Z., Tichy, M., Hippler, R.
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Volume:
100
Year:
2012
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3699229
File:
PDF, 787 KB
english, 2012
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