Highly ionized physical vapor deposition plasma source working at very low pressure
Stranak, V., Herrendorf, A.-P., Drache, S., Cada, M., Hubicka, Z., Tichy, M., Hippler, R.Volume:
100
Year:
2012
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3699229
File:
PDF, 787 KB
english, 2012