Dry etching characteristics of TiO2 thin films using...

Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing

Hotovy, I., Hascik, S., Gregor, M., Rehacek, V., Predanocy, M., Plecenik, A.
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Volume:
107
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2014.03.025
Date:
September, 2014
File:
PDF, 723 KB
english, 2014
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