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Dry etching characteristics of TiO2 thin films using inductively coupled plasma for gas sensing
Hotovy, I., Hascik, S., Gregor, M., Rehacek, V., Predanocy, M., Plecenik, A.Volume:
107
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2014.03.025
Date:
September, 2014
File:
PDF, 723 KB
english, 2014