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Using pulsed direct current power for reactive sputtering of Al[sub 2]O[sub 3]
Belkind, A., Freilich, A., Scholl, R.Volume:
17
Year:
1999
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.581706
File:
PDF, 382 KB
english, 1999