Mechanisms involved in HBr and Ar cure plasma treatments...

Journal of Applied Physics 2009 Vol. 105; Iss. 9

Mechanisms involved in HBr and Ar cure plasma treatments applied to 193 nm photoresists

Pargon, E., Menguelti, K., Martin, M., Bazin, A., Chaix-Pluchery, O., Sourd, C., Derrough, S., Lill, T., Joubert, O.
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Volume:
105
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3116504
File:
PDF, 689 KB
english, 2009
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