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Capacitance and conductance versus voltage characterization of Al2O3 layers prepared by plasma enhanced atomic layer deposition at 25 °C≤ T ≤ 200 °C
Henkel, Karsten, Gargouri, Hassan, Gruska, Bernd, Arens, Michael, Tallarida, Massimo, Schmeißer, DieterVolume:
32
Year:
2014
Language:
english
Journal:
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
DOI:
10.1116/1.4831897
File:
PDF, 1015 KB
english, 2014