Current flow through metal shunts in ohmic contacts ton+-Si
Sachenko, A. V., Belyaev, A. E., Pilipenko, V. A., Petlitskaya, T. V., Anischik, V. A., Boltovets, N. S., Konakova, R. V., Kudryk, Ya. Ya., Vinogradov, A. O., Sheremet, V. N.Volume:
48
Language:
english
Journal:
Semiconductors
DOI:
10.1134/S1063782614040241
Date:
April, 2014
File:
PDF, 764 KB
english, 2014