N2O plasma treatment suppressed temperature-dependent...

Surface and Coatings Technology 2013 / 9 Vol. 231

N2O plasma treatment suppressed temperature-dependent sub-threshold leakage current of amorphous indium–gallium–zinc-oxide thin film transistors

Chang, Geng-Wei, Chang, Ting-Chang, Jhu, Jhe-Ciou, Tsai, Tsung-Ming, Syu, Yong-En, Chang, Kuan-Chang, Jian, Fu-Yen, Hung, Ya-Chi, Tai, Ya-Hsiang
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Volume:
231
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2012.04.086
Date:
September, 2013
File:
PDF, 706 KB
english, 2013
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