Effect of Heavy Boron Doping on Oxygen Precipitation in...

Journal of The Electrochemical Society 2000 Vol. 147; Iss. 2

Effect of Heavy Boron Doping on Oxygen Precipitation in Czochralski Silicon Substrates of Epitaxial Wafers

Sueoka, Koji, Akatsuka, Masanori, Yonemura, Mitsuharu, Ono, Toshiaki, Asayama, Eiichi, Katahama, Hisashi
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Volume:
147
Year:
2000
Language:
english
Journal:
Journal of The Electrochemical Society
DOI:
10.1149/1.1393266
File:
PDF, 657 KB
english, 2000
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