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Thermally Activated Reorientation of Di-interstitial Defects in Silicon
Kim, Jeongnim, Kirchhoff, Florian, Aulbur, Wilfried G., Wilkins, John W., Khan, Furrukh S., Kresse, GeorgVolume:
83
Language:
english
Journal:
Physical Review Letters
DOI:
10.1103/PhysRevLett.83.1990
Date:
September, 1999
File:
PDF, 405 KB
english, 1999