Simulation of electromigration behaviour in Al...

Microelectronics Reliability 1992 Vol. 32; Iss. 1-2

Simulation of electromigration behaviour in Al metallization of integrated circuits

M. Scherge, V. Breternitz, Ch. Knedlik
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Volume:
32
Year:
1992
Language:
english
Pages:
4
DOI:
10.1016/0026-2714(92)90083-w
File:
PDF, 229 KB
english, 1992
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