Characterization of silicon nitride thin films deposited by hot-wire CVD at low gas flow rates
Oliphant, Clive J., Arendse, Christopher J., Muller, Theophillus F.G., Knoesen, DirkVolume:
285
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2013.08.075
Date:
November, 2013
File:
PDF, 2.05 MB
english, 2013