Impact of molecular size on resist filling process in...

Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures 2010 Vol. 28; Iss. 6

Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study

Taga, Akihiro, Yasuda, Masaaki, Kawata, Hiroaki, Hirai, Yoshihiko
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Volume:
28
Year:
2010
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.3511434
File:
PDF, 745 KB
english, 2010
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