Ti–Al–Si–N films for superhard coatings deposited by...

Ti–Al–Si–N films for superhard coatings deposited by reactive cosputtering using Ti, Al, and Si targets

A. Miyamura, M. Yamaguchi, K. Hattori, Y. Sato, S. Nakamura, Y. Shigesato
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
25
Year:
2007
Language:
english
DOI:
10.1116/1.2721577
File:
PDF, 665 KB
english, 2007
Conversion to is in progress
Conversion to is failed