High aspect ratio fine pattern transfer using a novel mold...

High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography

J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda, Y. Hirai
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Volume:
29
Year:
2011
Language:
english
DOI:
10.1116/1.3662080
File:
PDF, 1.15 MB
english, 2011
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