Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2011 Vol. 29; Iss. 6
High aspect ratio fine pattern transfer using a novel mold by nanoimprint lithography
J. Sakamoto, N. Fujikawa, N. Nishikura, H. Kawata, M. Yasuda, Y. HiraiVolume:
29
Year:
2011
Language:
english
DOI:
10.1116/1.3662080
File:
PDF, 1.15 MB
english, 2011