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Study of the microstructure of IC interconnect metallisations using analytical transmission electron microscopy and secondary ion mass spectrometry
P. Cosemans, M. D'Olieslaeger, W. De Ceuninck, L. De Schepper, L. StalsVolume:
36
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0026-2714(96)00177-1
File:
PDF, 304 KB
english, 1996