Investigation of trapped charge in oxides under...

Microelectronics Reliability 1996 Vol. 36; Iss. 11-12

Investigation of trapped charge in oxides under Fowler-Nordheim stress using low bias conditions

R. Duane, A. Martin, P. O'Donovan, P. Hurley, P. O'Sullivan, A. Mathewson
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Volume:
36
Year:
1996
Language:
english
Pages:
4
DOI:
10.1016/0026-2714(96)85823-9
File:
PDF, 270 KB
english, 1996
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