Annealing behavior of atomic layer deposited HfO[sub 2]...

Annealing behavior of atomic layer deposited HfO[sub 2] films studied by synchrotron x-ray reflectivity and grazing incidence small angle scattering

Green, M. L., Allen, A. J., Jordan-Sweet, J. L., Ilavsky, J.
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Volume:
105
Year:
2009
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.3125510
File:
PDF, 1.02 MB
english, 2009
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