Dependence of charge trapping and tunneling on the...

Dependence of charge trapping and tunneling on the silicon-nitride (Si[sub 3]N[sub 4]) thickness for tunnel barrier engineered nonvolatile memory applications

Jung, Myung-Ho, Kim, Kwan-Su, Park, Goon-Ho, Cho, Won-Ju
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Volume:
94
Year:
2009
Language:
english
Journal:
Applied Physics Letters
DOI:
10.1063/1.3078279
File:
PDF, 571 KB
english, 2009
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