A low thermal impact annealing process for SiO2-embedded Si...

A low thermal impact annealing process for SiO2-embedded Si nanocrystals with optimized interface quality

Hiller, Daniel, Gutsch, Sebastian, Hartel, Andreas M., Löper, Philipp, Gebel, Thoralf, Zacharias, Margit
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4870819
Date:
April, 2014
File:
PDF, 1.05 MB
english, 2014
Conversion to is in progress
Conversion to is failed