A low thermal impact annealing process for SiO2-embedded Si nanocrystals with optimized interface quality
Hiller, Daniel, Gutsch, Sebastian, Hartel, Andreas M., Löper, Philipp, Gebel, Thoralf, Zacharias, MargitVolume:
115
Language:
english
Journal:
Journal of Applied Physics
DOI:
10.1063/1.4870819
Date:
April, 2014
File:
PDF, 1.05 MB
english, 2014