Fabrication of large area subwavelength antireflection...

Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff

Yu, Zhaoning, Gao, He, Wu, Wei, Ge, Haixiong, Chou, Stephen Y.
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Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1619958
File:
PDF, 551 KB
english, 2003
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