Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures
2003 Vol. 21; Iss. 6
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Fabrication of large area subwavelength antireflection structures on Si using trilayer resist nanoimprint lithography and liftoff
Yu, Zhaoning, Gao, He, Wu, Wei, Ge, Haixiong, Chou, Stephen Y.Volume:
21
Year:
2003
Language:
english
Journal:
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures
DOI:
10.1116/1.1619958
File:
PDF, 551 KB
english, 2003