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Plasma-enhanced chemical vapor deposition of graphene on copper substrates
Woehrl, Nicolas, Ochedowski, Oliver, Gottlieb, Steven, Shibasaki, Kosuke, Schulz, StephanVolume:
4
Language:
english
Journal:
AIP Advances
DOI:
10.1063/1.4873157
Date:
April, 2014
File:
PDF, 1.58 MB
english, 2014