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[IEEE 2012 International Symposium on VLSI Technology, Systems and Application (VLSI-TSA) - Hsinchu (2012.04.23-2012.04.25)] Proceedings of Technical Program of 2012 VLSI Technology, System and Application - A high density cylinder-type MIM capacitor integrated with advanced 28nm logic High-K/Metal-Gate process for embedded DRAM
Tu, K. C., Wang, C. C., Hsieh, Y. T., Ting, Y. W., Chang, C. Y., Pai, C. Y., Tzeng, K. C., Chu, H. C., Lin, H. L., Chang, Y. W., Pen, C. N., Chen, K. W., Hsieh, T. H., Tsai, C. Y., Huang, K. C., ChianYear:
2012
Language:
english
DOI:
10.1109/VLSI-TSA.2012.6210164
File:
PDF, 334 KB
english, 2012