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Scale-up approach for industrial plasma enhanced chemical vapor deposition processes and SiOx thin film technology
Jin, Su B., Lee, Joon S., Choi, Yoon S., Choi, In S., Han, Jeon G., Hori, M.Volume:
547
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2013.03.061
Date:
November, 2013
File:
PDF, 804 KB
english, 2013