A convenient N2–CCl4 mixture plasma treatment to improve...

A convenient N2–CCl4 mixture plasma treatment to improve TiO2 photocatalytic oxidation of aromatic air contaminants under both UV and visible light

Hu, Shaozheng, Li, Fayun, Fan, Zhiping
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Volume:
286
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2013.09.052
Date:
December, 2013
File:
PDF, 693 KB
english, 2013
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