Improving the lifespan of the cantilever during electron...

Microelectronic Engineering 2012 / 10 Vol. 98

Improving the lifespan of the cantilever during electron assisted AFM lithography

Inoue, Takao, Taniguchi, Jun, Ochi, Toshihiko
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Volume:
98
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.05.019
Date:
October, 2012
File:
PDF, 1.06 MB
english, 2012
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