![](/img/cover-not-exists.png)
A plasma ion source with plane beam profile for UHV-SIMS measurements
Klaus-Dieter Klöppel, Wolfhart SeidelVolume:
177
Year:
1980
Language:
english
Pages:
7
DOI:
10.1016/0029-554x(80)90038-5
File:
PDF, 454 KB
english, 1980