Capacitively coupled r.f. plasma sources: a viable approach...

Diamond and Related Materials 1994 / 4 Vol. 3; Iss. 4-6

Capacitively coupled r.f. plasma sources: a viable approach for CVD diamond growth?

Beckman, Judith, Jackman, Richard B., Foord, John S.
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Volume:
3
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/0925-9635(94)90233-X
Date:
April, 1994
File:
PDF, 580 KB
english, 1994
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