Characterization of amorphous silicon films by Rutherford...

Nuclear Instruments and Methods 1980 Vol. 168; Iss. 1-3

Characterization of amorphous silicon films by Rutherford backscattering spectrometry

K. Kubota, T. Imura, M. Iwami, A. Hiraki, M. Satou, F. Fujimoto, Y. Hamakawa, S. Minomura, K. Tanaka
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Volume:
168
Year:
1980
Language:
english
Pages:
5
DOI:
10.1016/0029-554x(80)91255-0
File:
PDF, 388 KB
english, 1980
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