Ion implant gettering of generation impurities in silicon investigated using PIXE and Rutherford backscattering spectrometry
B. Golja, A.G. Nassibian, D. CohenVolume:
191
Year:
1981
Language:
english
Pages:
7
DOI:
10.1016/0029-554x(81)90984-8
File:
PDF, 420 KB
english, 1981