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Comparative study of anneal-induced modifications of amorphous carbon films deposited by dc magnetron sputtering at different argon plasma pressures
Jacobsohn, L.G., Prioli, R., Freire, F.L., Mariotto, G., Lacerda, M.M., Chung, Y.W.Volume:
9
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(99)00341-6
Date:
April, 2000
File:
PDF, 136 KB
english, 2000