Enhanced Kretschmann structure for maskless surface plasmon interference lithography
Guo, Xiaowei, Dong, Qiming, Shi, Ruiying, Li, Shuhong, Du, JingleiVolume:
105
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2012.11.026
Date:
May, 2013
File:
PDF, 667 KB
english, 2013