Magnetic properties of manganese implanted silicon after...

Vacuum 2013 / 3 Vol. 89

Magnetic properties of manganese implanted silicon after pulse plasma annealing

Werner, Z., Pochrybniak, C., Barlak, M., Gosk, J., Szczytko, J., Twardowski, A., Siwek, A.
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Volume:
89
Language:
english
Journal:
Vacuum
DOI:
10.1016/j.vacuum.2012.02.036
Date:
March, 2013
File:
PDF, 570 KB
english, 2013
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