Reliability of the doping concentration in an ultra-thin...

Reliability of the doping concentration in an ultra-thin body and buried oxide silicon on insulator (SOI) and comparison with a partially depleted SOI

Chang, Wen-Teng, Lai, Chun-Ming, Yeh, Wen-Kuan
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Volume:
54
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2013.10.012
Date:
February, 2014
File:
PDF, 1.32 MB
english, 2014
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