Influence of rapid thermal annealing temperature on...

Microelectronics Reliability 2014 / 02 Vol. 54; Iss. 2

Influence of rapid thermal annealing temperature on structure and electrical properties of high permittivity HfTiO thin film used in MOSFET

Ye, Cong, Zhan, Chao, Zhang, Jieqiong, Wang, Hao, Deng, Tengfei, Tang, Shiruo
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Volume:
54
Language:
english
Journal:
Microelectronics Reliability
DOI:
10.1016/j.microrel.2013.10.014
Date:
February, 2014
File:
PDF, 1.15 MB
english, 2014
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