![](/img/cover-not-exists.png)
Filling performance and electrical characteristics of Al2O3 films deposited by atomic layer deposition for through-silicon via applications
Choi, Kyeong-Keun, Kee, Jong, Kim, Si-Hong, Park, Myung-Soo, Park, Chan-Gyung, Kim, Deok-keeVolume:
556
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.01.081
Date:
April, 2014
File:
PDF, 1.20 MB
english, 2014