Artificial sub-μm magnetic patterning by He+ ion...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2014 / 03 Vol. 322

Artificial sub-μm magnetic patterning by He+ ion bombardment through a mask fabricated by Ultraviolet NanoImprint Lithography (UV-NIL)

Schmidt, Christoph, Smolarczyk, Marek, Gomer, Ludmilla, Hillmer, Hartmut, Ehresmann, Arno
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Volume:
322
Language:
english
Journal:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
DOI:
10.1016/j.nimb.2014.01.005
Date:
March, 2014
File:
PDF, 1.31 MB
english, 2014
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