Interfacial thermal stability and band alignment of...

Journal of Alloys and Compounds 2014 / 04 Vol. 591

Interfacial thermal stability and band alignment of Al2O3/HfO2/Al2O3/Si gate stacks grown by atomic layer deposition

Wei, H.H., He, G., Chen, X.S., Cui, J.B., Zhang, M., Chen, H.S., Sun, Z.Q.
How much do you like this book?
What’s the quality of the file?
Download the book for quality assessment
What’s the quality of the downloaded files?
Volume:
591
Language:
english
Journal:
Journal of Alloys and Compounds
DOI:
10.1016/j.jallcom.2013.12.152
Date:
April, 2014
File:
PDF, 1.85 MB
english, 2014
Conversion to is in progress
Conversion to is failed