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Limitations of patterning thin films by shadow mask high vacuum chemical vapor deposition
Reinke, Michael, Kuzminykh, Yury, Hoffmann, PatrikVolume:
563
Language:
english
Journal:
Thin Solid Films
DOI:
10.1016/j.tsf.2014.02.088
Date:
July, 2014
File:
PDF, 1.21 MB
english, 2014