Resistive switching in HfO2-based atomic layer deposition...

Applied Surface Science 2014 / 09 Vol. 312

Resistive switching in HfO2-based atomic layer deposition grown metal–insulator–metal structures

Jančovič, Peter, Hudec, Boris, Dobročka, Edmund, Dérer, Ján, Fedor, Ján, Fröhlich, Karol
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Volume:
312
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.05.018
Date:
September, 2014
File:
PDF, 12.02 MB
english, 2014
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