Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar...

Applied Surface Science 2014 / 08 Vol. 311

Etching of new phase change material Ti0.5Sb2Te3 by Cl2/Ar and CF4/Ar inductively coupled plasmas

Zhang, Zhonghua, Song, Sannian, Song, Zhitang, Cheng, Yan, Zhu, Min, Li, Xiaoyun, Zhu, Yueqin, Guo, Xiaohui, Yin, Weijun, Wu, Liangcai, Liu, Bo, Feng, Songlin, Zhou, Dong
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Volume:
311
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.05.002
Date:
August, 2014
File:
PDF, 1.18 MB
english, 2014
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