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Deuterium plasma exposure of rhodium films: Role of morphology and crystal structure
Uccello, A., Eren, B., Marot, L., Dellasega, D., Maffini, A., Steiner, R., Mathys, D., Meyer, E., Passoni, M.Volume:
446
Language:
english
Journal:
Journal of Nuclear Materials
DOI:
10.1016/j.jnucmat.2013.11.023
Date:
March, 2014
File:
PDF, 2.07 MB
english, 2014