Interface and plasma damage analysis of PEALD TaCN...

Applied Surface Science 2014 / 06 Vol. 303

Interface and plasma damage analysis of PEALD TaCN deposited on HfO2 for advanced CMOS studied by angle resolved XPS and C–V

Piallat, Fabien, Beugin, Virginie, Gassilloud, Remy, Dussault, Laurent, Pelissier, Bernard, Leroux, Charles, Caubet, Pierre, Vallée, Christophe
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Volume:
303
Language:
english
Journal:
Applied Surface Science
DOI:
10.1016/j.apsusc.2014.03.011
Date:
June, 2014
File:
PDF, 621 KB
english, 2014
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