Ultra-thin film and interface analysis of high-k dielectric...

Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms 2014 / 08 Vol. 332

Ultra-thin film and interface analysis of high-k dielectric materials employing Time-Of-Flight Medium Energy Ion Scattering (TOF-MEIS)

Primetzhofer, D., Dentoni Litta, E., Hallén, A., Linnarsson, M.K., Possnert, G.
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Volume:
332
Language:
english
Journal:
Nuclear Instruments and Methods in Physics Research Section B: Beam Interactions with Materials and Atoms
DOI:
10.1016/j.nimb.2014.02.063
Date:
August, 2014
File:
PDF, 623 KB
english, 2014
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