Photolithographic properties of tin-oxo clusters using...

Microelectronic Engineering 2014 / 09 Vol. 127

Photolithographic properties of tin-oxo clusters using extreme ultraviolet light (13.5nm)

Cardineau, Brian, Del Re, Ryan, Marnell, Miles, Al-Mashat, Hashim, Vockenhuber, Michaela, Ekinci, Yasin, Sarma, Chandra, Freedman, Daniel A., Brainard, Robert L.
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Volume:
127
Language:
english
Journal:
Microelectronic Engineering
DOI:
10.1016/j.mee.2014.04.024
Date:
September, 2014
File:
PDF, 1.56 MB
english, 2014
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