Transition metal nitride thin films grown by MOCVD using...

Surface and Coatings Technology 2013 / 09 Vol. 230

Transition metal nitride thin films grown by MOCVD using amidinato based complexes [M(NtBu)2{(iPrN)2CMe}2] (M=Mo, W) as precursors

Srinivasan, N.B., Thiede, T.B., de los Arcos, T., Gwildies, V., Krasnopolski, M., Becker, H.-W., Rogalla, D., Devi, A., Fischer, R.A.
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Volume:
230
Language:
english
Journal:
Surface and Coatings Technology
DOI:
10.1016/j.surfcoat.2013.06.024
Date:
September, 2013
File:
PDF, 1.02 MB
english, 2013
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