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The effect of hydrogen plasma chemical annealing on electron field emission of amorphous carbon films
Xu, Jun, Huang, Xiaohui, Li, Zhifeng, Li, Wei, Chen, KunjiVolume:
12
Language:
english
Journal:
Diamond and Related Materials
DOI:
10.1016/S0925-9635(03)00186-9
Date:
October, 2003
File:
PDF, 159 KB
english, 2003